Incorporating Megasonic Cleaners into Large Processing Systems

Environmental regulations impose restrictions on the use of aggressive chemicals commonly used in large processing systems, resulting in more stringent production part cleaning requirements.

Manufacturing lines often include cleaning steps to prepare parts for subsequent processing. Cleaning may include manual scrubbing, pressure washing, and soaking the parts in hot chemical baths. However manual scrubbing and pressure washing don’t guarantee thorough cleaning and may even damage the most fragile parts. Some parts used in modern products may be temperature-sensitive that could be damaged by hot chemical baths.

Semiconductor manufacturers use large processing systems in processing silicon wafers. Wafers have to be cleaned between process steps to reduce possible particle contamination that will affect the quality of devices produced. Cleaning silicon wafers are usually carried out using baths that contain harsh and aggressive chemicals.

Megasonic cleaning systems make an ideal alternative for removing contaminants from surfaces of parts that are being cleaned without manual scrubbing or the use of harsh chemicals.

In megasonic cleaning, the process can take place at room temperature and is completely safe, requiring no additional operator safety measures. No special support equipment is needed, and the cleaners work without the need for constant operator monitoring.

Megasonic cleaning systems clean parts by using very high frequency sound waves. These sound waves create microscopic cavitation bubbles when the sound waves pass through the cleaning solution. The scrubbing action of the bubbles, as they form and burst, dislodges contaminants, and allows them to be rinsed away. This cleaning mechanism is especially effective for stubborn microscopic particles that can cause semiconductor component defects. Incorporating the megasonic cleaning method produces silicon wafers that have fewer contaminating particles.

For manufacturers that want to reduce the use of expensive and toxic cleaning chemicals while improving the performance of their cleaning stations, megasonic cleaners can also be incorporated into larger processing systems to provide an effective solution.

One area that that megasonic cleaners are incorporated into large processing systems is in wet bench chemical stations used by semiconductor manufacturers. Incorporating megasonic cleaning systems into the semiconductor production line reduces chemical use and improves cleaning performance. Megasonic cleaners work mechanically to remove contaminants from surfaces of silicon wafers.

For more details read the complete article, Incorporating Megasonic Cleaners into Large Processing Systems. Contact Kaijo Shibuya at 808-675-5575 to set up a free consultation or  email info@kaijo-shibuya.com.