Monday, April 25, 2016

How High Power Ultrasonic Generators Provide Precise Cleaning for Industry Applications

Kajio’s Quava high-power ultrasonic generator is used in manufacturing operations that require precise cleaning of many different kinds of parts and components.

These cost-effective machines can clean using a variety of frequencies:
·         Low frequency (26 KHz or 36 KHz) - creates large cavitation bubbles that release high energy when they collapse. This frequency range enables removal of stubborn impurities from the surface of rigid and stable components, and is suitable for cleaning parts like medical tools, circuit boards, and ceramic components.
·         Higher frequency (100 KHz) - creates smaller bubbles and the energy applied to the surfaces of components is lower. This is suitable for cleaning more delicate surfaces like hard disk drive components and optical parts.
·         Highest frequency (750 KHz and 950 KHz) – this suitable for cleaning the most delicate surfaces that include finely machined components or semiconductors.

In addition to cleaning at different frequencies, the Quava high power ultrasonic generator can also adjust the power delivered to the cleaning solution (reaching up to 1200W). The high power capacity allows operators to adjust both the cleaning bubble energy and delivered power to match with the requirements of their application.

The benefits of the Quava High Power Ultrasonic Generator include:
· Improved cleaning during the manufacturing process 
· High quality and reliable industrial equipment at competitive pricing
· Cost effective and easy to use compared to chemical cleaning methods
· No field calibration needed
· Adjustable frequencies to fit your application requirements

The Quava high power ultrasonic generator is ideal for a manufacturing environment requiring a versatile ultrasonic cleaning unit. For more information read the blog article published on the site titled How High Power Ultrasonic Generators Provide Precise Cleaning for Industry Applications”.

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