How a Megasonic Cleaning System Removes Submicron Particles from Delicate Components

Megasonic cleaning systems use high frequency generators and transducers to clean delicate components like silicon wafers and other microelectronic devices. Megasonic cleaning has proven to be a faster, more effective, and more thorough for removing submicron particles from delicate components compared to other cleaning methods.

So how does a megasonic cleaning system work to remove such particles?

Like the ultrasonic cleaning system, the megasonic cleaning system relies on cavitation bubbles which scrub and clean away impurities from the surface of delicate components.

As a megasonic wave enters the cleaning fluid, the wave troughs produce areas of low pressure where the bubbles form. When the pressure reaches its highest peak, the bubbles collapse and releases energy which acts to scrub and clean away the contaminants on the surface of the devices being cleaned.

When the system frequency increases, the waves become closer together and there is less time for the bubbles to form. As a result, higher frequencies generate smaller bubbles. These bubbles do the gentler cleaning action on delicate components as the collapsing bubbles become less energetic.

Submicron contaminants are quite difficult to clean away because they can be small enough to be lodged in the boundary between the solid wafer and the free-flowing cleaning solution. The megasonic cleaning system enables the bubbles to move straight to the submicron particles. As the bubbles collapse, the resulting energy becomes strong enough to dislodge the submicron particles off of the surface. This cleaning process proves to be more effective in dislodging even the smallest and the most stubborn submicron particles from delicate semiconductor components and results in fewer defects in the final product. Megasonic cleaning produces a current in the solution to ensure that the small particles won't attach to the surface of the semiconductor components again.

Kaijo has been providing a wealth of expertise and experience in manufacturing ultrasonic and megasonic cleaning systems for many years. These systems can be standardized or customized according to the clients' preference. The company's "Quava megasonic cleaning system" is a cost-effective solution that can operate at either lower or higher ultrasonic frequencies for several specific cleaning applications.

To learn more about our megasonic cleaning systems read the full article “How a Megasonic Cleaning System Removes Submicron Particles from Delicate Components”. If you have additional questions, feel free to call Kaijo Shibuya or send an email to info@kaijo-shibuya.com.